The cleaning technology using the solubility of the supercritical fluid attracts attention in the field broad as its environmental friendliness. Since the surface tension is low, a supercritical fluid infiltrate into details and it can clean it, without changing a detailed pattern.
Carbon dioxide gas cleaning system
Cleaning vessel (with heater and auto open / close hutch)
Liquid supply vessel (With condensater)
Waste liquid collection vessel (Heater included)
Filter (Stand-by changeover)
Automatic control panel (Touch panel)
Drying system is not required
Recycle of cleaning media is easy
Waste liquid treat is not needed
Cleaning is performed at subcritical area which is closed to supercritical
Cleaning waste liquid is separated into carbon dioxide and residue
Carbon dioxide is liquefied for reuse.
Residue is only pure cleaning residue
Dry cleaning: Cloth cleaning, removal of a remains toxic substance
Precision mechanical parts: Oil removal, solvent removal
Semiconductor field: Wafer, resist film exfoliation, IT parts cleaning
Cleaning of parts and material, which are weak with water or heat, is possible.
Drying process in not required
Cleaning of combined material is possible
CO2 gas recirculation system
Consult us for special specifications
Ihis is a equipment which performs the surface treatment of a wafer in supercritical CO2.
|Cleaning vessel size||3.3L|
Wafer cleaning system